2021.08.20
2021.08.20 Y. Ohno, T. Yokoi, Y. Sh…
2021.08.20
Y. Ohno, T. Yokoi, Y. Shimizu, J. Ren, K. Inoue, Y. Nagai, K. Kutsukake, K. Fujiwara, A. Nakamura, K. Matsunaga, H. Yoshida, “Segregation mechanism of arsenic dopants at grain boundaries in silicon”, Sci. Technol. Adv. Mater. 1 (2021) 169-180. (2021) https://doi.org/10.1080/27660400.2021.1969701